SiC coatings grown by liquid injection chemical vapor deposition using single source metal-organic precursors
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منابع مشابه
High vacuum chemical vapor deposition of cubic SiC thin ž / films on Si 001 substrates using single source precursor
Ž . Thin films of cubic SiC have been prepared on Si 001 substrates in situ by high vacuum metal-organic chemical vapor Ž . deposition HVMO-CVD method using a single source precursor at various growth temperatures in the range of 300]10008C. Ž . 1,3-Disilabutane, H Si-CH -SiH -CH DSB that contains the same amount of silicon and carbon atoms in the same molecule 3 2 2 3 Ž . was used as precursor...
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